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Reactive Sputtering

Reactive Sputtering

Reactive Sputtering is a PVD process that combines metal sputtering with a reactive gas plasma. For this technology MicroDyn® machines are used that enable highly temperature stable, precision coatings.

Materials and Substrate Choices

Materials
Silicon oxide
Niobium oxide
Zirconium oxide
Titanium oxide
Tantalum oxide
Hafnium oxide
Iron and iron oxide
Substrates
Technical glasses
Optical glasses
Ceramic
Plastics (PC)
Aluminum
 
 

Capabilities of the MicroDyn® Process

  • Large variety of deposition materials
  • Temperature resistance up to 1,200 °C
  • Superior reflectance with 95% to 98%
  • Spectral edge accuracy within ± 1 nm
  • High optical uniformity
  • No temperature shift
  • High precision coating designs
  • Masking and patterning availabe

Fields of Application

  • Color filters
  • Anti-reflex coatings
  • UV-coatings
  • Mirrors
  • Beam splitters