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PICVD

PICVD

Plasma Impulse Chemical Vapor Deposition (PICVD) is a unique technology developed by Auer Lighting. The combination of a CVD process with plasma impulses open a wild range of applications:

  • Coatings on inner and outer surfaces of inorganic (glass, glass-ceramics, ceramics, metal) and organic (plastics) substrates in flat or 3D shape are possible  

  • Filters, mirrors, functional and decorative coatings

Materials and Substrate choice

Materials
Silicon dioxide
Titanium dioxide
Zirconium dioxide
Yttrium oxide
Tin oxide
Substrates
Glass
Ceramic
Aluminum
Plastics (PC, PEI, PEEK, PET)
 

Coating Capabilities

  • Cost efficient with high deposition rates
  • Piece-by-piece coating resulting high yield
  • Reliable process
  • Clean without clean room
  • Automated

Example: High Reflective PICVD Coating vs Standard Aluminum Coating for Reflectors used in LED Applications